Optimal polarization modulation for orthogonal two-axis Lloyd’s mirror interference lithography

Interference Lithography

Interference lithography (IL) is the preferred method for fabricating periodic and quasi-periodic patterns that must be spatially coherent over large areas. IL is a conceptually simple process where two coherent beams interfere to produce a standing wave, which can be recorded in a photoresist. The spatial-period of the grating can be as fine as half the wavelength of the interfering light, all...

Interference Lithography for Patterned Media

Micro-mirror Arrays for Maskless Lithography

This paper presents a design approach for fabricating an array of MEMS mirrors suitable for maskless lithography applications in a commercial CMOS process. A small footprint mirror design is presented which uses a pair of support beams for signal routing and diagonal gap-closing actuators for mirror deflection. The actuators are shown to be capable of delivering up to 10nN of force per micron o...

Orthogonal Lithography for Organic Electronics CNF

We introduce a new class of photo-electron-beam resists and solvents which are benign to organic electronic materials. We demonstrate that our patterning approach enables the fabrication of unique organic electronic devices, such as all organic thin film transistors, patterned light emitting diode displays and top-contact small channel length thin film transistors. Summary of Research: Organic ...

Low-cost interference lithography

The authors report demonstration of a low-cost 1000 USD interference lithography system based on a Lloyd’s mirror interferometer that is capable of 300 nm pitch patterning. The components include only a 405 nm GaN diode-laser module, a machinist’s block, a chrome-coated silicon mirror, substrate, and double-sided carbon scanning electron microscopy SEM tape. The laser and the machinist’s block ...